High-throughput, high-accuracy wafer scribing solution that addresses the challenges associated with thinner and more fragile materials.

Process newer thin wafers efficiently at the higher level of accuracy.

For semiconductor manufacturers looking to maintain high-throughput processing of wafers without risking damage to the device, ESI provides a laser based system that employs the right laser paired with beam positioning capabilities to create a wafer scribing solution that works well with new material, even low-k.


Ultrafast laser scribing solution for next-generation low-K materials and thin wafers.

The Ultrus wafer grooving solution enables semiconductor manufacturers to optimize their production capabilities and meet production challenges related to processing current and next-generation materials and thin wafers. Ultrus systems apply ultrafast high-pulse-rate laser processing technology to easily integrate new materials into the wafer processing workflow.

Ultrus delivers a low cost-of-ownership solution for the combined challenges of newer materials and thin wafers, and the need to maintain high-volume production throughput. 

The ultrafast laser technology employed in Ultrus enables chip manufacturers to incorporate leading-edge processing techniques into their production operation, and still maintain high die break strength and minimize heat affected zones. Allowing for more precise removal of metal layers and fragile materials from dicing streets from a wider range of materials—without damaging the underlying device. The result is higher production quality and higher backend yields.

learn more about Ultrus

  • Laser Grooving/Scribe
  • Silicon

For industries facing material transformation challenges in production,  ESI applies unique process and engineering expertise to deliver a set of laser-based solutions that extend our customers’ processing capabilities beyond the limitations of mechanical.

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